Molecular beam epitaxy apparatus

专利名称：Molecular beam epitaxy apparatus发明人：Tanaka, Haruo,Mushiage, Masato,Ishida,

Yuhji

申请号：EP89105248.2申请日：19890323公开号：EP0335267B1公开日：19940629

摘要：A molecular beam epitaxy apparatus comprises a growth chamber (2) providedtherein with a holder support frame (3) and connected via a first gate valve (8) to apreparation chamber (10) which in turn is connected to a loading chamber (11) via asecond gate valve (9). A first transfer tray (23) arranged in the loading chamber receives aset of substrates (B) from outside and advances into the preparation chamber. A secondtransfer tray (24) supports a substrate holder (H) in the preparation chamber to allowthe set of substrates to be transferred from the first tray onto the holder by the aid of asubstrate transfer assembly (28). The second tray is advanced into the growth chamberto transfer the loaded holder onto the holder support frame.

申请人：ROHM CO LTD

地址：JP

国籍：JP

代理机构：Reinhard - Skuhra - Weise & Partner

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