专利名称：Positive working photoresist composition发明人：Kawabe, Yasumasa, c/o Fuji Photo Film Co.,
Ltd.,Tan, Shiro, c/o Fuji Photo Film Co., Ltd.
申请号：EP96115173.5申请日：19960920公开号：EP0766139A1公开日：19970402
摘要：Provided is a positive working photoresist composition comprising (A) an alkali-soluble novolak resin obtained by condensation reaction of a mixture of phenols, whichare constituted of specified proportions of m-cresol and two kinds of specific phenols,with an aldehyde and having a Mw/Mn ratio of from 1.5 to 4.0 (wherein Mw stands for aweight-average molecular weight, and Mn stands for a number-average molecularweight); (B) a 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic acid ester as a
photosensitive material; and (C) a low molecular weight compound having from 12 to 50carbon atoms per molecule and from 2 to 8 phenolic hydroxy groups per molecule.
申请人：FUJI PHOTO FILM CO., LTD.
地址：210 Nakanuma Minami-Ashigara-shi Kanagawa JP
国籍：JP
代理机构：Barz, Peter, Dr.
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